PRODUCTS DETAILS

Home > Products >

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle With Low Power

Products

Ultrasonic Spray Coating Machine

Ultrasonic Sonochemistry Equipment

Ultrasonic Processing Equipment

Ultrasonic Plastic Welding Machine

Ultrasonic Piezoelectric Transducer

Ultrasonic Wire Harness Welding Machine

Ultrasonic Metal Welding Machine

Contact Now

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle With Low Power

MOQ:	1 UNIT
Price:	Negotation
Standard Packaging:	Packed by carton
Payment Method:	T/T, Western Union
Supply Capacity:	1000 unit per month

Detail Information

Product Description

Detail Information

Place of Origin

CHINA

Brand Name

FUNSONIC

Certification

Model Number

FSW-3002-L

Production Name:

30Khz Scattering Ultrasonic Nozzle Atomization

Frequency:

30Khz

Max Power:

Automized Particle Size Range:

15-40μm

Spray Flow:

0.5-20ml

Liquid Viscosity:

<30cps

Particle Size:

<12μm

Application:

Suitable For Full Surface Spraying Of Flux

Highlight:

Low Power Ultrasonic Spray Scattering Nozzle

Semiconductor Lens Ultrasonic Spray Scattering Nozzle

30Khz Ultrasonic Spray Scattering Nozzle

Product Description

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle with Low Power

Description:

The typical application of scattering type ultrasonic nozzles is the photoresist coating on semiconductor chips, where the photoresist is sprayed onto the semiconductor chips. Due to the rotational scattering of mist emitted by the scattering type ultrasonic nozzle, a uniform photoresist film can be formed not only on the wafer plane, but also on the sidewalls and corners of the wafer microstructure. In addition, scattering ultrasonic nozzles can also be used for thin film solar cell coatings, calcium titanate solar cell coatings, AR transmission and reflection film coatings, insulation film coatings, superhydrophobic coating coatings, PCB flux coatings, and other applications.

Parameters:

Model	FSW-3002-L
Name	30Khz Scattering Ultrasonic Nozzle Atomization
Frequency	30Khz
Atomized particle size range(μm)	15-40
Spray width(mm)	40-80
Spray flow(ml/min)	0.5-20
Spray height(mm)	30-80
Liquid viscosity (cps)	<30
Particle size (μm)	<15
Diversion pressure (Mpa)	<0.05
Application	Suitable for Photoresist coatings on semiconductor chips

Advantages:

1. Large surface spraying, spraying width: 40-150mm

2. Coating uniformity:>95% uniformity

3. Saving raw materials: The utilization rate of raw materials is over 85%, which is 4 times higher than traditional two fluid spraying

4. High precision in coating thickness control: can prepare coatings ranging from 20nm to tens of micrometers, with precise control of coating thickness

5. Fine atomized particles

6. Uniform atomization of particles

7. It can be sprayed intermittently or continuously

8. Ultra low spray flow

9. Will not block the nozzle

10. Anti corrosion nozzle

11. High precision and controllable spraying

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle with Low Power

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle With Low Power 0

Tags:

Anti Restenosis Polymers Medical Spraying Machine,

Ultrasonic Probe Type Nozzle 40Khz,

Ultrasonic Wide Open Mist Fan Shaped Area Spraying Nozzle System

Contact Now

PRODUCTS DETAILS

Products

Ultrasonic Metal Welding

Ultrasonic Spray Coating Machine

Ultrasonic Indium Coating

Ultrasonic Sonochemistry Equipment

Ultrasonic Melt Treatment

Ultrasonic Assisted Machining

Ultrasonic Processing Equipment

Ultrasonic Plastic Welding Machine

Ultrasonic Sewing Machine

Ultrasonic Cutting Machine

Ultrasonic Welding Converter

Ultrasonic Welding Transducer

Ultrasonic Piezoelectric Transducer

Ultrasonic Oscillator

Ultrasonic Wave Generator

Ultrasonic Wire Harness Welding Machine

Ultrasonic Metal Welding Machine

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle With Low Power

MOQ:	1 UNIT
Price:	Negotation
Standard Packaging:	Packed by carton
Payment Method:	T/T, Western Union
Supply Capacity:	1000 unit per month

Detail Information

Product Description

Detail Information

Place of Origin

CHINA

Brand Name

FUNSONIC

Certification

Model Number

FSW-3002-L

Production Name:

30Khz Scattering Ultrasonic Nozzle Atomization

Frequency:

30Khz

Max Power:

50w

Automized Particle Size Range:

15-40μm

Spray Flow:

0.5-20ml

Liquid Viscosity:

<30cps

Particle Size:

<12μm

Application:

Suitable For Full Surface Spraying Of Flux

Minimum Order Quantity:

1 UNIT

Price:

Negotation

Packaging Details:

Packed by carton

Payment Terms:

T/T, Western Union

Supply Ability:

1000 unit per month

Highlight

Low Power Ultrasonic Spray Scattering Nozzle

Semiconductor Lens Ultrasonic Spray Scattering Nozzle

30Khz Ultrasonic Spray Scattering Nozzle

Product Description

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle with Low Power

Description:

Parameters:

Model	FSW-3002-L
Name	30Khz Scattering Ultrasonic Nozzle Atomization
Frequency	30Khz
Atomized particle size range(μm)	15-40
Spray width(mm)	40-80
Spray flow(ml/min)	0.5-20
Spray height(mm)	30-80
Liquid viscosity (cps)	<30
Particle size (μm)	<15
Diversion pressure (Mpa)	<0.05
Application	Suitable for Photoresist coatings on semiconductor chips

Advantages:

1. Large surface spraying, spraying width: 40-150mm

2. Coating uniformity:>95% uniformity

3. Saving raw materials: The utilization rate of raw materials is over 85%, which is 4 times higher than traditional two fluid spraying

4. High precision in coating thickness control: can prepare coatings ranging from 20nm to tens of micrometers, with precise control of coating thickness

5. Fine atomized particles

6. Uniform atomization of particles

7. It can be sprayed intermittently or continuously

8. Ultra low spray flow

9. Will not block the nozzle

10. Anti corrosion nozzle

11. High precision and controllable spraying

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle with Low Power

30Khz Semiconductor Lens Ultrasonic Spray Scattering Nozzle With Low Power 0

Tags: